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001 ocn854583694
003 OCoLC
005 20220711204132.0
006 m o d
007 cr |||||||||||
008 130411s2013 nyu ob 001 0 eng
010 _a 2020687136
040 _aDLC
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019 _a858126055
020 _z9781626180345
_q(ebook)
020 _a9781624179594
_q(hardcover)
020 _a1624179592
020 _a1626180342
_q(electronic bk.)
020 _a9781626180345
_q(electronic bk.)
029 1 _aAU@
_b000062327189
029 1 _aDEBBG
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029 1 _aNZ1
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029 1 _aDEBSZ
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035 _a(OCoLC)854583694
_z(OCoLC)858126055
041 1 _aeng
_hrus
050 0 0 _aTK7871.15.S55
072 7 _aTEC
_x008010
_2bisacsh
082 0 0 _a621.3815/31
_223
049 _aMAIN
100 1 _aVasilʹev, V. I︠U︡.
_q(Vladislav I︠U︡rʹevich)
_9958834
240 1 0 _aTonkie sloi borofosforosilikatnogo stekla v tekhnologii kremnievoæi mikroçelektroniki.
_lEnglish
245 1 0 _aBorophosphosilicate glass thin films in electronics /
_cVladislav Yu. Vasilyev.
264 1 _aNew York :
_bNova Science Publishers,
_c[2013]
300 _a1 online resource.
336 _atext
_btxt
_2rdacontent
337 _acomputer
_bc
_2rdamedia
338 _aonline resource
_bcr
_2rdacarrier
490 1 _aMaterials science and technologies
490 0 _aElectronics and telecommunications research
500 _aTranslation of: Tonkie sloi borofosforosilikatnogo stekla v tekhnologii kremnievoĭ mikroėlektroniki.
504 _aIncludes bibliographical references (pages 221-234) and index.
588 _aDescription based on print version record and CIP data provided by publisher.
505 0 _aBOROPHOSPHOSILICATE GLASS THIN FILMS IN ELECTRONICS ; Library of Congress Cataloging-in-Publication Data ; CONTENTS ; PREFACE ; LIST OF ABBREVIATIONS (IN ORDER OF APPEARANCE) ; LIST OF IMPORTANT SYMBOLS (IN ORDER OF APPEARANCE); INTRODUCTION ; PART 1. BPSG THIN FILM DEPOSITION; Chapter 1 BRIEF HISTORICAL OVERVIEW OF BPSG THIN FILM RESEARCH ; Chapter 2 BASIC BPSG FILM CVD TOOLS AND METHODOLOGY ; 2.1. CVD PROCESS COMPOUNDS ; 2.2. BASIC CVD TOOL DESIGN FOR SILICON DIOXIDE AND GLASS FILM DEPOSITION ; 2.3. SOME BASIC THIN FILM CVD PROCESS PARAMETERS.
505 8 _aChapter 3 BASIC BPSG CVD KINETIC FEATURES 3.1. BASIC THIN FILM CVD KINETIC FEATURES ; 3.2. BASIC SILICON DIOXIDE THIN FILM CVD KINETIC FEATURES ; 3.3. BASIC SILICATE GLASS THIN FILM CVD KINETIC FEATURES ; 3.4. BASIC AEROSOL FORMATION FEATURES AT GLASS CVD ; Chapter 4 AS-DEPOSITED BPSG FILM STEP COVERAGE AND GAP-FILL ; 4.1. BASIC DEFINITIONS OF STEPPED DEVICE STRUCTURES ; 4.2. BASIC DEFINITIONS FOR THIN FILM CVD ON STEPPED DEVICE STRUCTURES ; 4.3. CHARACTERIZATION OF CVD PROCESSES ON STEPPED STRUCTURES ; 4.4. IMPROVEMENT OF GLASS FILM CVD ON STEPPED STRUCTURES.
505 8 _aChapter 5 GLASS FILM CVD SCHEMES 5.1. GENERAL THIN FILM CVD PROCESS SCHEME ; 5.2. CVD THIN FILM DEPOSITION PROCESSES CLASSIFICATION ; 5.3. THIN FILM SIO AND SILICATE GLASS DEPOSITION PROCESSES SCHEMES 2; Chapter 6 BPSG FILM INDUSTRIAL CVD TECHNOLOGY ; FINAL REMARKS ON PART 1 ; PART 2. BPSG FILM COMPOSITION, STRUCTURE, AND PROPERTIES ; Chapter 7 BRIEF REVIEW ON BPSG THIN FILM ANALYSIS TECHNIQUES ; 7.1. ANALYTICAL METHODS OVERVIEW ; 7.2. FTIR METHOD IMPLEMENTATION BPSG FILM COMPOSITION ANALYSIS ; 7.3. LASER SCANNING METHOD ; 7.4. MICROSCOPY METHODS.
505 8 _a7.5. TOTAL CHARGE MAPPING METHODS 7.6. SECONDARY ION MASS SPECTROMETRY METHOD ; Chapter 8 BPSG FILM COMPOSITION ; Chapter 9 BPSG FILM STRUCTURE ; 9.1. BRIEF REVIEW OF SILICA STRUCTURE: BASICS AND TERMS ; 9.2. BRIEF REVIEW OF BORON OXIDE AND PHOSPHORUS OXIDE STRUCTURES ; 9.3. BPSG COMPOSITION AND STRUCTURE ; 9.4. DIFFERENCES IN BPSG COMPOSITION AND STRUCTURE ; Chapter 10 BASIC BPSG FILM PROPERTIES ; 10.1. SURFACE MORPHOLOGY OF THIN GLASS FILMS ; 10.2. FILM MECHANICAL STRESS ; 10.3. FILM DENSITY -- FILM POROSITY -- FILM SHRINKAGE ; 10.4. FILM WET ETCH RATE.
505 8 _a10.5. GETTERING PROPERTIES OF BPSG FILMS10.6. ELECTRICAL PROPERTIES OF BPSG FILMS ; 10.7. SUMMARIES OF BPSG FILM PROPERTIES FOR PRODUCTION PROCESSES ; Chapter 11 BPSG FILM FLOW CAPABILITY ; 11.1. BRIEF DESCRIPTION OF GLASS FLOW BASICS ; 11.2. GLASS STRUCTURE FEATURES AND GLASS FLOW CAPABILITY ; 11.3. APPLICATION OF BULK GLASS PARAMETERS TO GLASS THIN FILM ; Chapter 12 BPSG FILM -- AMBIENT MOISTURE INTERACTION ; 12.1. TECHNIQUE FOR ANALYSIS OF MOISTURE EFFECTS IN THIN GLASS FILMS ; 12.2. FILM-MOISTURE INTERACTION ; 12.3. DESCRIPTION OF MOISTURE ABSORPTION EFFECTS IN BPSG FILMS.
546 _aText in English.
590 _aeBooks on EBSCOhost
_bEBSCO eBook Subscription Academic Collection - Worldwide
650 0 _aElectronic apparatus and appliances
_xMaterials.
_9150701
650 0 _aGlass coatings.
_9958835
650 0 _aBoron compounds.
_9599632
650 0 _aSilicon compounds.
_9920067
650 0 _aGlass manufacture
_xChemistry.
_9958836
650 2 _aBoron Compounds
_9599632
650 2 _aSilicon Compounds
_9920067
650 6 _aVerre
_xRevêtements protecteurs.
_9958837
650 6 _aBore
_xComposés.
_9958838
650 6 _aSilicium
_xComposés.
_9958839
650 7 _aTECHNOLOGY & ENGINEERING
_xElectronics
_xCircuits
_xGeneral.
_2bisacsh
_938237
650 7 _aBoron compounds.
_2fast
_0(OCoLC)fst00836715
_9599632
650 7 _aElectronic apparatus and appliances
_xMaterials.
_2fast
_0(OCoLC)fst00906813
_9150701
650 7 _aGlass coatings.
_2fast
_0(OCoLC)fst00943107
_9958835
650 7 _aGlass manufacture
_xChemistry.
_2fast
_0(OCoLC)fst00943193
_9958836
650 7 _aSilicon compounds.
_2fast
_0(OCoLC)fst01118665
_9920067
655 0 _aElectronic books.
655 4 _a7
_aElectronic books.
_9848615
700 1 _aVasilʹev, V. I︠U︡.
_q(Vladislav I︠U︡rʹevich)
_9958834
776 0 8 _iPrint version:
_tBorophosphosilicate glass thin films in electronics
_dNew York : Nova Science Publishers, Inc., [2013]
_z9781624179594 (hardcover)
_w(DLC) 2013002527
830 0 _aMaterials science and technologies series.
_9926602
856 4 0 _uhttps://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&AN=619652
938 _aYBP Library Services
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