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Microelectronics, Microsystems and Nanotechnology : Papers Presented at MMN 2000, Athens, Greece, 20-22 November 2000 / editors, Androula G. Nassiopoulou, Xanthi Zianni.

Contributor(s): Material type: TextTextPublication details: New Jersey : World Scientific, ©2001.Description: 1 online resource (xvii, 390 pages) : illustrationsContent type:
  • text
Media type:
  • computer
Carrier type:
  • online resource
ISBN:
  • 9789812810861
  • 9812810862
  • 1281956457
  • 9781281956453
Contained works:
  • Conference on "Microelectronics, Microsystems, and Nanotechnology" (1st : 2000 : Athens, Greece). Papers
Subject(s): Genre/Form: Additional physical formats: Print version:: Microelectronics, Microsystems, and Nanotechnology.DDC classification:
  • 621.381 22
LOC classification:
  • TK7874 .M484 2001eb
Online resources:
Contents:
Foreword; CONTENTS; Nanotechnology and Quantum Devices; A New Strategy for In Situ Synthesis of Oligonucleotides Arrays for DNA Chip Technology; Magnetotransport Properties of La-Ca-Mn-O Multilayers; A Novel Method for the Calculation of the Local Electric Field at the Emitting Surface of a Carbon Single-Wall nanotube; Study of Photoluminescence and Micro-Photoluminesence of V-Shaped Quantum Wires; Catalytic Action of Ni Atoms in the Formation of Carbon Nanotubes: A Combined Ab-initio and Molecular Dynamics study; Si Nanocrystal MOS Memory Obtained by Low-Energy Ion Beam Synthesis.
Charge Effects and Related Transport Phenomena in Nanosize Silicon/Insulator StructuresRadiative Recombination from Silicon Quantum Dots in Si/SiO2 Superlattices; Avalanche Porous Silicon Light Emitting Diodes for Optical Intra-Chip Interconnects; Infrared Absorption in Strained Si/Si1-xGex/Si Quantum Wells; Thermopower Calculations at Filling Factor 3/2 and 1/2 for Two-Dimensional Systems; Thermoelectric Properties of Composite Fermions; Design and Fabrication of Supported-Metal Catalysts Through Nanotechnology.
Calculated Spontaneous Emission Rates in Silicon Quantum Wires Grown in {100} PlaneElectrical Modeling and Characterization of Si/SiO2 Superlattices; Ge/SiO2 Thin Layers Through Low-Energy Ge+ Implantation and Annealing: Nanostructure Evolution and Electrical Characteristics; Vertical Transport Mechanisms in nc-Si / CaF2 Multi-layers; Photo- and Electroluminescence from nc-Si / CaF2 Superlattices; Ab Initio Calculation of the Optical Gap in Small Silicon Nanoparticles; Ground State Electronic Structure of Small Si Quantum Dots; Processing; Technology Roadmap Challenges for Deep Submicron CMOS.
Photolithographic Materials for Novel Biocompatible Lift Off ProcessesPolycrystalline Silicon Thin Film Transistors Having Gate Oxides Deposited Using TEOS; Solid Interface Studies with Applications in Microelectronics; A Comparison Between Point Defect Injecting Processes in Silicon Using Extended Defects and Dopant Marker Layers as Point Defect Detectors; Rapid Thermal Annealing of Arsenic Implanted Silicon for the Formation of Ultra Shallow n+p Junctions; Simulation of the Formation and Characterization of Roughness in Photoresists; F2 laser (157 nm) Lithography: Materials and Processes.
Fabrication of Fine Copper Lines on Silicon Substrates Patterned with AZ 5214 Photoresist via Selective Chemical Vapor DepositionInvestigation of the Nitridation of Al2O3 (0001) Substrates by a Nitrogen Radio Frequency Plasma Source; Simulation of Si and SiO2 Feature Etching in Fluorocarbon Plasmas; Epitaxial ErSi2 on Strained and Relaxed Si1-x Gex; Development of a New Low Energy Electron Beam Lithography Simulation Tool; CMOS Devices and Devices Based on Compound Semiconductors; Advanced SOI Device Architectures for CMOS ULSI.
Summary: This volume contains papers on the following: CMOS devices and devices based on compound semiconductors; processing; silicon integrated technology and integrated circuit design; quantum physics; nanotechnology; nanodevices, sensors and microsystems. Contemporary news and future challenges in these fields are presented in invited papers.
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"This volume contains the papers presented at the First Conference on "Microelectronics, Microsystems and Nanotechnology" ..."--Foreword.

Includes bibliographical references and index.

Print version record.

This volume contains papers on the following: CMOS devices and devices based on compound semiconductors; processing; silicon integrated technology and integrated circuit design; quantum physics; nanotechnology; nanodevices, sensors and microsystems. Contemporary news and future challenges in these fields are presented in invited papers.

Foreword; CONTENTS; Nanotechnology and Quantum Devices; A New Strategy for In Situ Synthesis of Oligonucleotides Arrays for DNA Chip Technology; Magnetotransport Properties of La-Ca-Mn-O Multilayers; A Novel Method for the Calculation of the Local Electric Field at the Emitting Surface of a Carbon Single-Wall nanotube; Study of Photoluminescence and Micro-Photoluminesence of V-Shaped Quantum Wires; Catalytic Action of Ni Atoms in the Formation of Carbon Nanotubes: A Combined Ab-initio and Molecular Dynamics study; Si Nanocrystal MOS Memory Obtained by Low-Energy Ion Beam Synthesis.

Charge Effects and Related Transport Phenomena in Nanosize Silicon/Insulator StructuresRadiative Recombination from Silicon Quantum Dots in Si/SiO2 Superlattices; Avalanche Porous Silicon Light Emitting Diodes for Optical Intra-Chip Interconnects; Infrared Absorption in Strained Si/Si1-xGex/Si Quantum Wells; Thermopower Calculations at Filling Factor 3/2 and 1/2 for Two-Dimensional Systems; Thermoelectric Properties of Composite Fermions; Design and Fabrication of Supported-Metal Catalysts Through Nanotechnology.

Calculated Spontaneous Emission Rates in Silicon Quantum Wires Grown in {100} PlaneElectrical Modeling and Characterization of Si/SiO2 Superlattices; Ge/SiO2 Thin Layers Through Low-Energy Ge+ Implantation and Annealing: Nanostructure Evolution and Electrical Characteristics; Vertical Transport Mechanisms in nc-Si / CaF2 Multi-layers; Photo- and Electroluminescence from nc-Si / CaF2 Superlattices; Ab Initio Calculation of the Optical Gap in Small Silicon Nanoparticles; Ground State Electronic Structure of Small Si Quantum Dots; Processing; Technology Roadmap Challenges for Deep Submicron CMOS.

Photolithographic Materials for Novel Biocompatible Lift Off ProcessesPolycrystalline Silicon Thin Film Transistors Having Gate Oxides Deposited Using TEOS; Solid Interface Studies with Applications in Microelectronics; A Comparison Between Point Defect Injecting Processes in Silicon Using Extended Defects and Dopant Marker Layers as Point Defect Detectors; Rapid Thermal Annealing of Arsenic Implanted Silicon for the Formation of Ultra Shallow n+p Junctions; Simulation of the Formation and Characterization of Roughness in Photoresists; F2 laser (157 nm) Lithography: Materials and Processes.

Fabrication of Fine Copper Lines on Silicon Substrates Patterned with AZ 5214 Photoresist via Selective Chemical Vapor DepositionInvestigation of the Nitridation of Al2O3 (0001) Substrates by a Nitrogen Radio Frequency Plasma Source; Simulation of Si and SiO2 Feature Etching in Fluorocarbon Plasmas; Epitaxial ErSi2 on Strained and Relaxed Si1-x Gex; Development of a New Low Energy Electron Beam Lithography Simulation Tool; CMOS Devices and Devices Based on Compound Semiconductors; Advanced SOI Device Architectures for CMOS ULSI.

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