TY  - GEN
AU  - Jung,Hyun Wook
AU  - Jung,Hyun Wook
TI  - Thin Film Processes
SN  - books978-3-03936-265-3
PY  - 2020///
CY  - Basel, Switzerland
PB  - MDPI - Multidisciplinary Digital Publishing Institute
KW  - History of engineering & technology
KW  - bicssc
KW  - electrode
KW  - layer-by-layer
KW  - liquid crystal device
KW  - thin film
KW  - 6082-T6 aluminum alloy
KW  - Plasma Electrolytic Oxidation (PEO)
KW  - Plasma Spray Ceramic (PSC)
KW  - Hard Anodizing (HA)
KW  - anodic polarization
KW  - corrosion resistance
KW  - lemongrass
KW  - Cymbopogon citratus
KW  - convection drying
KW  - mathematical modeling
KW  - moisture diffusivity
KW  - activation energy
KW  - Jeffrey, Maxwell, Oldroyed-B fluids
KW  - unsteady stretching surface
KW  - magnetic field
KW  - homotropy analysis method (HAM)
KW  - entropy generation
KW  - second-grade fluid
KW  - nanofluid
KW  - liquid films
KW  - time depending stretching surface
KW  - HAM
KW  - Al(OH)3
KW  - BaSO4
KW  - filler
KW  - ultrafine powder coatings
KW  - Sisko fluid
KW  - unsteady stretching sheet
KW  - thin films
KW  - MHD
KW  - HAM and numerical method
KW  - coatings industry
KW  - digitalization
KW  - development process
KW  - technical enabler
KW  - process analysis
KW  - process simulation
KW  - hydrocarbon fuel
KW  - coke
KW  - anti-coking coating
KW  - growth characteristics
KW  - n/a
N1  - Open Access
N2  - Thin film processes are significantly incorporated in manufacturing display panels, secondary batteries, fuel/solar cells, catalytic films, membranes, adhesives, and other commodity films. This Special Issue on "Thin Film Processes" of Processes listed recent progress on thin-film processes, covering theoretical considerations, experimental observations, and computational techniques. Articles in this Issue consider comprehensive studies on thin film processes and related materials
UR  - https://mdpi.com/books/pdfview/book/2661
UR  - https://directory.doabooks.org/handle/20.500.12854/68894
ER  -