Horizons in world physics. Volume 275 / Albert Reimer, editor.

Includes bibliographical references and index.

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HORIZONS IN WORLD PHYSICS. VOLUME 275; HORIZONS IN WORLD PHYSICS. VOLUME 275; Library of Congress Cataloging-in-Publication Data; CONTENTS; PREFACE; Chapter 1: COMPLEX DYNAMICS IN JOSEPHSON JUNCTION SYSTEMS; Abstract; 1. Introduction to Josephson Systems; 2. Dynamical Analysis for Several Types of Josephson-JunctionSystems; 2.1. Regular dynamics and bifurcations; 2.2. Josephson system (I); 2.3. Josephson system (II)2; 2.4. Josephson system (II)5; 2.5. Josephson junction system (II)36; 2.6. Josephson junction system (II)46; 2.7. Josephson junction system (II)56.

2.8. Josephson junction system (II)663. Conclusions; References; Chapter 2: FABRICATION OF MICROPATTERNED TEMPLATES FOR IMMOBILIZING INORGANIC AND ORGANIC MATERIALS BY PHOTOLITHOGRAPHY; 1. INTRODUCTION; 2. SUPERHYDROPHOBIC/SUPERHYDROPHILIC MICROPATTERNING ON A POLYMERIC SUBSTRATE; 3. CONTROL OF SITE-SELECTIVE ADSORPTION REACTION ON A BIOMIMETIC SUPERHYDROPHILIC/SUPERHYDROPHOBIC MICROPATTERNED TEMPLATE; 4. MICROPATTERNING OF FIBROBLAST CELLS CULTURED ON A BIOMIMETIC SUPERHYDROPHOBIC/SUPERHYDROPHILIC SURFACE.

5. SELECTIVE GROWTH OF HIGHLY CRYSTALLINE HYDROXYAPATITE IN A MICRO-REACTION CELL OF AGAR GEL6. SELECTIVE GROWTH OF UPCONVERTING YBPO4:LN (LN = ER OR TM) CRYSTALS IN A MICRO REACTION CELL; 7. SUMMARY AND OUTLOOK; REFERENCES; Chapter 3: SU-8 PROCESSES FOR MICROFLUIDIC RADIATION DETECTORS AND INTEGRATED OPTICAL WAVEGUIDES; 1. INTRODUCTION; 2. THE SU-8 PHOTORESIST; 3. STANDARD SU-8 PROCESSING; 4. SU-8 AS A STRUCTURAL MATERIAL FOR BUILDING WAVEGUIDES; 4.1. Fabrication Process-Flow; 4.2. Scintillation Particle Detector Based on Microfluidic Waveguides; 5. EMBEDDED MICROCHANNELS; 5.1. Fabrication.

5.2. Embedded Microfluidic Channels Used as Waveguides6. CONCLUSION; REFERENCES; Chapter 4: NON-THERMAL EFFECTS IN METAL TARGETS IRRADIATED BY SUBTHRESHOLD LASER PULSES; ABSTRACT; 1. INTRODUCTION; 2. MECHANOLUMINESCENCE; 2.1. Experimental Setup; 2.2. Stress and Time Distributions; 2.3. Multi-Pulse Irradiation; 2.4. Theory; 3. BACK-SIDE SURFACE PERTURBATION; CONCLUSION; REFERENCES; Chapter 5: THE 40AR( -, N)39CL REACTION IN THE ATMOSPHERE BY COSMIC-RAY MUONS; ABSTRACT; 1. INTRODUCTION; 2. FORMATION OF CHLORINE ISOTOPES; 3. INSTRUMENTATION; 4. CHEMICAL PROCEDURES; 5. RESULTS AND DISCUSSION.

6. CONCLUSIONSREFERENCES; Chapter 6: OPTICAL LITHOGRAPHY FOR THE FABRICATION OF MEMS SENSORS; ABSTRACT; 1. A BRIEF DESCRIPTION OF THE OPTICAL LITHOGRAPHY PROCESS; 2. CONSIDERATIONS ON PHOTOMASK DESIGN FOR MEMS SENSORS; 2.1. Photomasks Design for Development of a SiC Piezoresistive Pressure Sensor; 3. PHOTOMASK FABRICATION; 4. PROCESS FLOW FOR FABRICATION OF SiC PIEZORESISTIVE PRESSURE SENSORS; (a) Oxidation of the Si Substrate; (b) Backside Photolithography to Define the Diaphragm Area; (c) Etching of Si in KOH Solution; (d) Deposition of the SiC Film.

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